Toshiba Corp. and NEC Electronics Corp. said they will collaborate in developing technologies to process system LSI circuits with a line width of 32 nanometers.

Since February 2006, the two firms have been working together on 45-nanometer system large scale integrated circuits at Toshiba’s Advanced Microelectronics Center in Yokohama, Kanagawa Prefecture, southwest of Tokyo.

The companies will step up their collaboration in a bid to accelerate development and cut costs, they said.  The two firms will consider launching joint production of the 32-nanometer chips, and will map out concrete plans next year.